Thursday, September 20, 2018

Topic Two: Pattern and Ornament, Part 3

The presentation that we were unable to continue in class today can be found here.  This presentation gives you further context for the CAM Raleigh reading, as well as contextual information regarding Modernism, Kitsch and Postmodernism.  Please review it; it will help your overall understanding of the topic.

Information Regarding Critique, Tuesday, September 25:

You now have 4 full working days to create an ambitious artwork that is derived from the processes we modeled to you throughout the duration of this topic. 

Critique will be broken up into two groups, one with Don (groups A & B) and the other with Kathleen (groups C & D).  Meet in our regular room; Don's group will set up for critique in 5208.  Don's group should not set up work in 5219.

Topic Two: Pattern and Ornament
Critique ‘Rubric’

1)      Relevance to Topic Two: Can the viewer understand how individual and/or cultural experience has shaped or influenced the design and execution of the artwork? 
2)      Ambition: Is the work ambitious? Did you invest significant time in the process, and does it show?
3)      Execution: Does the work successfully convey what you intended?  Consider this through: your craftsmanship, your communicative goals, your use of design, your compositional decisions, your technical choices, and your skills.
4)      Professionalism: Is the work presented in a professional manner?  Understand that “professional” doesn’t automatically mean “framed”, “matted”, or “on a pedestal”.  Presentation that is not professional is most obvious because it distracts from the presence and communicative goals of the artwork by an intrusion of unintentional context.

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